When the chlorine comes in contact with moisture , even under very low concentrations , this gas becomes extremely corrosive and the hydrochloric acid formed attacks quickly the transportation components and lines.
In chlorine production plants , the chlorine gas drying is achieved by sulfuric acid spray and it is recommended to proceed with on line moisture measurement upstream of compression and liquefaction.
In other way , as the main part of process stream operates at vacuum , the risk of moisture intrusion into the circuit dictates this measurement.
The chlorine DET H2O is based on electrolytic analysis for water traces measurement in chlorine.
The chlorine DET H2O system controls all conditioning functions for analysis such as pressure and flow controls , measuring sensor validation device and inert gas purging.
The chlorine DET H2O is housed in Polyester enclosure rated IP 65 ( NEMA 4X ) compatible with corrosive environments and temperature controlled usually at 40°C +/- 1°C.
The chlorine DET H2O measuring principle is based on Faraday’s law of electrolysis and does not require calibration , however the cell reactivity can be validated by internal device.
The sample wetted materials of the chlorine DET H2O are in Monel 400 , PTFE , glass and platinum in full compatibility with chlorine gas.
The chlorine DET H2O measurement range is programmable from 0-50 PPB to 1 000 PPM and can be expressed in dew point when required.
Usually installed in non corrosive area or in control room , the chlorine DET H2O control unit is linked to the analyzer sensor by a standard two wires cable , maximum loop length is 2 Km.
The chlorine Moisture Monitor range , alarm threshold points and other parameters are programmed via integrated key-board with digital read-out.
The outlet signal is available as 4-20 mA analogue or digital serial 432 C / 485 bi-directional.Back to previous page